Edgewave‘s PX-Series of Ultrashort Pulse InnoSlab Lasers are a range of picosecond oscillator and amplifier systems. Based on InnoSlab technology, the PX-Series offer power up to 400W and pulse energy of 1000uJ with a 10ps pulse duration.
Edgewave‘s PX-Series of Ultrashort Pulse InnoSlab Lasers are a range of picosecond oscillator and amplifier systems. Based on InnoSlab technology, the PX-Series offer power up to 400W and pulse energy of 1000uJ with a 10ps pulse duration.
EdgeWave’s ultra short pulse lasers are diode-pumped and mode locked solid-state oscillators and amplifiers. The amplifiers are based on the unique InnoSlab laser technology. Through an optimal combination of crystal shape, cooling and resonator design, ultra short pulse lasers with InnoSlab amplifiers benefit from the following qualities : Compact setup, high efficiency and high amplification factor, high beam quality and scalability for multi kW power levels.
The PX-series of picosecond oscillator and amplifer systems have the following
Main Features :
Model | PXxxx-1 | PXxxx-2 | PXxxx-3 | PXxxx-4 | ||||
Wavelength [nm] | IR | Green | UV | DUV | ||||
Highest beam quality M² | 1.1 | 1.1 | 1.1 | 1.1 | ||||
Max. average power [W] | 400 | 200 | 90 | 15 | ||||
Max. repetition rate [MHz] | 100 | 100 | 100 | 100 | ||||
Max. pulse energy [µJ] | 1400 | 700 | 340 | 170 | ||||
Pulse width [ps] | 12 | 12 | 12 | 12 | ||||
Energy stability [%] rms | 1 | 2 | 2 | 3 | ||||
Timing stability [ns] | 20 | 20 | 20 | 20 | ||||
Polarisation | > 100:1 | > 100:1 | > 100:1 | > 100:1 | ||||
Beam Ellipticity (far field) [%] | < 10 | < 10 | < 10 | < 10 | ||||
Diameter at window [mm] | 3 | 3 | 3 | 3 | ||||
Full divergence angle [µrad] | 500 | 250 | 226 | 226 | ||||
Point stability [µrad] | <50 | <50 | <50 | <50 | ||||
Warm-up time from cold start [min] | 15 | 20 | 30 | 30 | ||||
Warm-up time from standby [min] | 10 | 15 | 30 | 30 |
Power supply | 90 V-264 V or 180 V-264 V, 50/60 Hz | |||||||
Power | 1.2 kW-3.6 kW | |||||||
Chiller | 230, 208, 115, 100 V, 50/60 Hz | |||||||
Power | 0.8 kW-3.6 kW | |||||||
Operation ambient temperature | 15 °C-35 °C | |||||||
Relative humidity, non-condensing | 10 %-80 % |
Laser head | 650 mm x 298 mm x 150 mm | |||||||
Supply incl. chiller | 19“x(10HU–15HU)x700mm | |||||||
Laser head | < 50 kg | |||||||
Supply incl. chiller | 62 kg-110 kg |
milling, cutting and drilling of
display-glass, sapphire, ceramic, etc.
ablation and structuring of thin layer
precision 3D engraving
milling, drilling and cutting of CFP
laser induced selective etching
rapid prototyping