The world-leading PHAROS industrial femtosecond laser system from Light Conversion. An extremely robust and reliable femtosecond laser system, offering impressive flexibility in a fully industrialised package.
The world-leading PHAROS industrial femtosecond laser system from Light Conversion. An extremely robust and reliable femtosecond laser system, offering impressive flexibility in a fully industrialised package.
The PHAROS lasers are a series of femtosecond lasers combining multi‑millijoule pulse energy and high average power. The PHAROS features a mechanical and optical design optimised for both scientific and industrial applications. A compact, thermally‑stabilized, and sealed design enables PHAROS integration into various optical setups and machining workstations. The robust optomechanical design provides an exceptional laser lifetime and stable operation in varying environments.
The tunability of PHAROS allows the system to cover applications normally requiring multiple different laser systems. Tunable parameters include pulse duration (100 fs – 20 ps), repetition rate (single-shot – 1 MHz), pulse energy (up to 4 mJ), and average power (up to 20 W).
A pulse-on-demand mode is available using the built-in pulse picker. The versatility of PHAROS can be extended by a variety of options, including carrier-envelope phase (CEP) stabilization, repetition rate locking to an external source, automated harmonic modules (for access to ~515nm, ~343nm, ~257nm and ~206nm) and a whole family of ORPHEUS optical parametric amplifiers for wavelength-tunable output options from the UV to the Mid-IR.
OUTPUT CHARACTERISTICS
Model | PH2-10W | PH2-20W-SP | PH2-4mJ | PH2-UP | ||
---|---|---|---|---|---|---|
Centre Wavelength | 1030 ± 10 nm | |||||
Maximum output power | 10W | 20W | 20W | |||
Pulse duration | < 290 fs | < 190 fs | < 450 fs | < 100 fs | ||
Pulse duration tuning range | 290 fs – 10 ps (20 ps on request) |
190 fs – 10 ps (20 ps on request) |
450 fs – 10 ps | 100 fs – 10 ps | ||
Maximum pulse energy | 0.2 mJ | 0.4 mJ | 1 mJ | 2 mJ | 4 mJ | 0.4 mJ |
Repetition rate | Single-shot – 1 MHz | |||||
Pulse selection | Single-shot, pulse-on-demand, any fundamental repetition rate division | |||||
Polarization | Linear, horizontal | |||||
Beam quality, M2 | < 1.2 | < 1.3 | <1.2 | |||
Beam diameter | 3.3 ± 0.3 mm | 4.0 ± 0.5 mm | 4.5 ± 0.5 mm | 4.5 ± 0.5 mm | ||
Beam pointing stability | < 20 µrad/°C | |||||
Pre-pulse contrast | < 1 : 1000 | |||||
Post-pulse contrast | ||||||
Pulse-to-pulse energy stability, 24 h | < 0.5% | |||||
Long-term power stability, 100 h | <0.5% |
MAIN OPTIONS
Model | PH2-10W | PH2-20W-SP | PH2-4mJ | PH2-UP |
---|---|---|---|---|
Oscillator output | 1 – 6 W, 50 – 250 fs, ≈ 1035 nm, ≈ 76 MHz | |||
Harmonic generator | 515 nm, 343 nm, 257 nm, or 206 nm | |||
Optical parametric amplifier | 320 – 10000 nm | |||
BiBurst mode | Tunable GHz and MHz burst with burst-in-burst capability | |||
CEP stabilization | Check options for details | |||
Repetition rate locking |
PHYSICAL DIMENSIONS
Model | PH2-10W | PH2-20W-SP | PH2-4mJ | PH2-UP | ||
---|---|---|---|---|---|---|
Laser head (L × W × H) | 730 × 419 × 230 mm | 827 × 492 × 250 mm | 730 × 419 × 230 mm | |||
Chiller (L × W × H) | 590 × 484 × 267 mm | |||||
24 V DC power supply (L × W × H) |
280 × 144 × 49 mm |
ENVIRONMENTAL & UTILITY REQUIREMENTS
Model | PH2-10W | PH2-20W-SP | PH2-4mJ | PH2-UP |
---|---|---|---|---|
Operating temperature | 15 – 30 ºC (air conditioning recommended) | |||
Relative humidity | < 80% (non-condensing) | |||
Electrical requirements | 100 V AC, 12 A – 240 V AC, 5 A; 50 – 60 Hz | |||
Rated power | 1000 W | |||
Power consumption | 600 W | |||
CHILLER | ||||
Electrical requirements | 100 – 230 V AC; 50 – 60 Hz | |||
Rated power | 1400 W | |||
Power consumption | 1000 W |
Precision micromachining (e.g. cutting, drilling, surface structuring, marking, selective ablation, polishing etc.)
Ultrafast spectroscopy
Advanced microscopy
High-energy and attosecond science
Micro and nanofabrication