Frequad-Ni

The Frequad series of CW 266 nm DUV Lasers is composed of deep-ultraviolet (DUV) wavelength (266 nm) continuous wave (CW) single-frequency wavelength conversion lasers which have more than 20 years of history.

OXIDE’s highly reliable wavelength-conversion crystals have enabled stable CW laser operation and precision voice coil motors (VCMs) achieved by proprietary high-speed servo-locking technology.

OXIDE offers 4 Frequad variants depending on the desired output. (Frequad-HP, Frequad-M, Frequad-C and Frequad-NI).

Main Features:

High Damage Threshold BBO Wavelength Conversion Crystal

• The outstanding quality of OXIDE’s own BBO crystal provides over 3000 hours single-spot lifetime at 1 W output power, and over 1000 hours at 2 W. Furthermore, the little deterioration of the crystal assures stable motion for a long period of time at high beam quality.

Highly sophisticated servo-lock technology

• OXIDE’s unique high-speed, high-precision voice coil motor (VCM) servo actuator offers stable CW operation of laser

Low power consumption

• The highly efficient wavelength conversion laser system realized extremely low power consumption – less than 340 W.

• UV Absorption & Fluorescence Spectroscopy
  • The Frequad-Ni’s single-frequency, narrow-linewidth output is well matched to high-resolution spectroscopic measurements of aromatic molecules, nucleotides, and other UV-absorbing species. The moderate power level minimises sample photobleaching compared to higher-power sources.
• Biological Microscopy & Imaging
  • 266 nm excitation enables label-free imaging of cellular structures based on the native UV absorption and autofluorescence of nucleic acids and proteins. The excellent beam quality (M² < 1.2) supports diffraction-limited focusing in confocal and multiphoton microscope configurations.
• Holography & Interferometry
  • The long coherence length and frequency stability of the Frequad-Ni make it suitable for holographic recording and interferometric measurement systems in the DUV, including surface profiling and wavefront sensing applications.
• Photochemistry & Surface Modification
  • 266 nm photons carry sufficient energy (4.66 eV) for direct photochemical modification of polymer surfaces, thin films, and organic materials. The stable CW output simplifies dose control in process development.