The OXIDE QCW 266 nm laser is a high-power quasi-continuous-wave (QCW) deep-UV laser designed for applications requiring high average power, high repetition rates and stable, low-peak-power UV output. Operating at 266 nm with a 100 MHz repetition rate, the QCW266 combines OXIDE’s wavelength-conversion technology with high-quality nonlinear crystals to provide a reliable source for demanding semiconductor, spectroscopy and materials research applications.
Available with 2 W, 3 W, 6 W or 8 W average output power, the QCW provides substantially higher average power than conventional CW 266 nm sources while maintaining a pulse width of less than 50 ps. The high repetition rate distributes the available energy across a large number of pulses, reducing peak power and helping to minimise damage to optical components and samples.
The OXIDE QCW 266 nm laser uses a high-reliability fibre-amplification architecture followed by two-stage wavelength conversion to generate the 266 nm output. OXIDE’s proprietary high-purity crystal technology is designed for long-term stable operation, with an expected lifetime of more than 10,000 hours. The system also provides excellent beam quality, with M² <1.2 for the 2 W, 3 W and 6 W models and M² <1.5 for the 8 W version.
A 3 mm ±0.3 mm beam diameter, horizontal linear polarisation and an extinction ratio above 100:1 provide well-defined optical characteristics for precision UV applications. The system is water-cooled and operates from a 100–240 VAC, 50/60 Hz supply. Power consumption is below 450 W for the 2–6 W models and below 650 W for the 8 W configuration.
Applications include semiconductor inspection, photolithography, Raman spectroscopy and photoluminescence, where high-power 266 nm illumination and controlled peak power are important.
